THE PHOTOGRAPHY MASTER RETREAT
July 8 to 15, 2017 in the south of France
Deadline for application: January 10, 2017
THE PHOTOGRAPHY MASTER RETREAT, in its third edition, will be held from July 8 to 15, 2017 for a select group of fourteen participants who will be chosen by the mentors from submitted applications which are due latest by January 10, 2017. It is designed for professional and aspiring professional photographers – fine art, conceptual, and documentary – who are passionate about their work and want to take it to the next level.
This unique one-week, mentor-led retreat for photographers is held in the remote medieval hamlet of Esparon in the south of France every year in July, after les Rencontres d'Arles.
Four internationally acclaimed Mentors will guide, advise and inspire fourteen participants:
Elisabeth Biondi, former New Yorker Visuals Editor and Curator;
Lyle Rexer, Critic, Curator and Educator;
and Artist-Educators Martine Fougeron and Katharina Bosse.
Photographers have the opportunity to examine their work and practice with daily stimulating group sessions and one-on-ones. The four mentors are committed to taking individual students to their highest photographic potential in a creative, supportive, and enjoyable environment. It is a career-enhancing opportunity for professional critique, artistic introspection and for bonding with peers. It is conducive to quiet inspiration. There will be conversation, delicious communal meals, as well as hard work during the one-on-one meetings and group sessions.
This memorable immersive experience is not a shooting trip but a rare chance for students to REFLECT on their trajectory, RETHINK their projects and REFOCUS on a clearer course.
Deadline for application is January 10, 2017.
Visit THE PHOTOGRAPHY MASTER RETREAT website for more information and full details on how to submit your application: : http://www.thephotographymasterretreat.com